ZONE 1:
Thin film deposition for solar cells based on amorphous silicon
ZONE 2:
Not in use
ZONE 3:
Printing
Roll to roll processes
PDMS line
ZONE 4:
Mechanical microresonator characterization
ZONE 5:
Photolithography for :
Positive resist (AZ1500, AZ9260, AZ ECI 3000)
Negative resis (SU-8, EpoClad, AZ nLOF 2000, AZ5214 E)
Dry Etching for:
Silicon, SiNx, SiOx, SiO2, glass
PECVD:
SiNx, SiOx, a-Si
ZONE 6:
Liquid crystals line
Microoptics characterisation
ZONE 7:
E-beam lithography
ZONE 8:
AFM
Interference lithography