Facilities

GROWTH

  • Metal-organic vapor phase epitaxy (MOVPE)
    – two reactors (one 1×2″ and one 3×2″/1×4″)
  • Ammonia and plasma molecular beam
    epitaxy (MBE)
  • Hydride vapor phase epitaxy (HVPE)

CHARACTERIZATION

  • High resolution X-ray diffraction (HRXRD)
  • Atomic force microscopy (AFM)
  • Scanning electron microscopy (SEM)
  • Photoluminescence (PL)
  • Micro-photoluminescence (µ-PL)
  • Time-resolved photoluminescence (TRPL)
  • Electroluminescence (EL)
  • (Time-resolved) Cathodoluminescence (CL)
  • Reflectivity
  • Photoreflectance
  • Integrating sphere
  • Hall effect
  • Electrochemical C-V
  • Second-order correlation function measurements
  • Micro-Raman spectroscopy
  • Hakki-Paoli and variable stripe length gain measurements

PROCESSING

  • E-beam & Optical lithography
  • Wet etching
  • Reactive-ion etching
  • Plasma etching
  • Electron-beam evaporators
  • Plasma-enhanced chemical-vapor deposition (PECVD)
  • Wet thermal oxidation