– n°8: Module n°5 ONLY
– n°7: Module n°5 ONLY
– n°6: DO NOT USE
– n°5: DO NOT USE
– n°4: DO NOT USE
– n°3: DO NOT USE
– n°2: Useable in modules n°2, 3, 4, 6
– n°1: Useable in modules n°2, 3, 4, 6
Contents
I. Introduction ↑
The CT200 is a cluster tool which allows the deposition of metallic or dielectric materials on wafers by RF, DC, pulsed DC or HiPIMS sputtering.
The tool is equipped with 5 chambers (Process modules – PM) and a loadlock, all connected to a transfer module. A robot is in charge of transfers between modules.
The configuration of the system is:
- Module n°2 – Oxides & Nitrides (3 x cathodes Ø 100 mm confocal, RF/DC-pulsed)
- Module n°3 – UHV Ferromagnetic metals & Metals (4 x cathodes Ø 100mm confocal, RF/DC-pulsed + HiPIMS)
- Module n°4 – Dielectrics (1 x cathode Ø 250mm, planar, RF-Sputtering)
- Module n°5 – UHV Semiconductors & Metals (4 x cathodes Ø 100mm confocal, RF/DC-pulsed + HiPIMS)
- Module n°6 – Nitrides (3 x cathodes Ø 100 mm confocal, RF/DC-pulsed)
A shuttle is used to transport samples. Possible samples sizes are:
- Chips : A 100 mm carrier (i.e dummy wafer) is required.
- Wafers:
- 100 mm : As standard.
- 150 mm.
- 200 mm (At room temperature only).
For more details, see Available PVD targets in CMi page.
Subject to changes: CT200 targets locations
II. Equipment description ↑
Loadlock
In the loadlock, a magazine with 8 x shuttles can be found. Sequences of deposition (defined by a recipe) can be set individually to each slot.
Transfer module
A robot located in the transfer module is in charge of transfers in the different modules. The tool is able to process in parallel samples depending on the availability of modules.
Substrate holder
Substrate holders (Modules n°2, 3, 4 & 6) heating up to 950° max. 950°C (= ~700°C on Si wafer).
Substrate holder polarization (RF Bias) possible for activation / cleaning / densification in all modules.
Pumping
Pumping in the system is achieved by:
- Dry primary pumps:
- Pfeiffer Vacuum – ACP40
- Pfeiffer Vacuum – ACP28
- Turbo pumps or cryogenic pumps:
- Pfeiffer Vacuum – ATH1603M
- Edwards CTI – On-Board 8
Pressure
The control of the pressure in modules is achieved by VAT throttle valves [0-100%].
Gauges:
- Inficon BCG450
- Inficon CDG045D
Gas
Different gases are available:
- Ar (All PM)
- N2 (PM2, PM4, PM6)
- O2 (PM2, PM4)
- Xe (PM3)
- H2 5% forming gas (PM5)
Sources & Magnetron
RF, DC / Pulsed DC and HiPIMS generators are :
- DC / Pulsed DC generator: ADVANCED ENERGY – Solvix
- RF generator: COMET – cito Plus
- HiPIMS (PM3 & PM5 only) : IONAUTICS
III. How to use the system ↑
Please refer to the following instructions to operate the tool :