Skip to content
Electron beam lithography system
- Equipment
- – 100 keV Thermal Field Emission Gun
– Gaussian Beam > 1 nm minimum pixel size
– > 20 nm mean + 3σ overlay accuracy
– 50 MHz Pattern Generator
– 50, 100, 150 mm wafers and piece parts
– Housed in a custom cleanroom 21 °C ± 0.1 °C
– Location: Zone 7 - Documentation
- – Manual
- Responsibles
- Z. Benes
M. Chahid
Manual coater and Develop wet benches
- Equipment
- – Programmable coater for ebeam resists
– 50, 100, 150 mm wafers and piece parts
– Manual dispense
– Location: Zone 7 - Documentation
- – Manual
- Responsibles
- Z. Benes
M. Chahid
Hot plates and Dryer
- Equipment
- – Hotplate for dehydration and soft bake of ebeam resists
– Maximal temperature: 200 °C
– Location: Zone 7 - Documentation
- – Manual
- Responsibles
- Z. Benes
M. Chahid
- Equipment
- – Hotplate for dehydration and soft bake of ebeam resists
– Maximal temperature: 200 °C
– Location: Zone 7 - Documentation
- – Manual
- Responsibles
- Z. Benes
M. Chahid