![](https://www.epfl.ch/research/facilities/cmi/wp-content/uploads/2020/03/tool_description-384x216.png)
Tool Description
Explanation of basic tool components and concepts, such as writing fields, stitching, dose, frequency, etc.
![](https://www.epfl.ch/research/facilities/cmi/wp-content/uploads/2020/03/FOXfracture-384x216.jpg)
Writing Strategy
Explanation of image formation using a round Gaussian beam spot and rectangular pixel grid. Beam size as a function of beam current.
![](https://www.epfl.ch/research/facilities/cmi/wp-content/uploads/2020/05/EBEAM_charging_substrate-384x216.jpg)
Conductive Substrate
Ebeam litho at 100kV can only be performed on electrically conductive substrates.
![](https://www.epfl.ch/research/facilities/cmi/wp-content/uploads/2020/06/Opaque_surface_3-384x216.jpg)
Opaque Reflective Surface
Sample surface must be opaque and reflective to enable correct in-situ laser height measurement during exposure.
![](https://www.epfl.ch/research/facilities/cmi/wp-content/uploads/2021/12/Alignment_for_web-384x216.jpg)
Alignment
Written patterns can be aligned to pre-existing structures on the wafers/chips. Overlaying of multiple levels is possible.