Thin film deposition through a shadow mask is a quick process for PVD layer structuring. It enables fast prototyping by avoiding lithography and etching steps.
Alignment and temporary fixation of the shadow mask to the wafer is possible with the Idonus shadow mask aligner.
The system offers stable alignment accuracy with a 5x microscope objectives setup and with an integrated vibration-resistant clamping chuck.
In very particular cases, the chuck can directly be inserted in the PVD tool for deposition. After deposition, the wafer and the mask are separated and the shadow mask can be reused.
