When you access EPFL websites, we may set cookies on your devices and process personal data about you in accordance with our privacy policy. You can block cookies by using your browser settings.
– Automatic (batch) spin-coating and development – 100mm and 150mm wafers – Up to 9 photoresist pump dispense lines + 3 N2 pressure dispense lines – 3 photoresist developer lines (spray or puddle) – HMDS vapor-prime module – Effective mini-environment and temperature control in spin-modules
– i-line resists: AZ ECI 3007, AZ 3027, AZ 1512, AZ 12XT, AZ nLOF 2020, AZ nLOF 2070 – Protection resist: AZ P4K-AP – Lift-off bottom layer: LOR 5A, LOR 15C – Anti-reflection bottom layer (BARC): XHRiC-16 – Developer chemistry: AZ 726 MIF (2.38% TMAH), AZ Developer (aluminum firendly)
– Automatic (batch) spin-coating and development – 100mm and 150mm wafers – Up to 7 photoresist dispense lines + 1 syringe line – 2 photoresist developer lines (spray or puddle) – HMDS vapor-prime module
– i-line resists: AZ ECI 3007, AZ 3027, AZ 10XT-20, AZ 40XT, AZ 15nXT, AZ nLOF 2020 – Developer chemistry: AZ 726 MIF (2.38% TMAH), AZ 400 K / H2O 1:3.5 (KOH)
– Automatic processing of masks, i.e. chrome blanks (Cr: ~100nm (LRC), PR: AZ1505 500nm) – Compatible with 4inch, 5inch, 6inch and 7inch plates – Photoresist development, chrome etch, photoresist strip steps are run in sequence or individually.
– Programmable spin-sequence for i-line photoresists – Sawatec SM-200 coater + SSE VB20 HMDS vapor prime module – 1 x high precision Präzitherm hotplate – 1 x high temperature hotplate – Chucks for wafers up to 200mm – Chucks for small chips (min. 10x10mm2) – Manual dispense
– Programmable spin-sequence for SU-8 – Combi coater + 2 x HP-200 hotplates – Chucks for 50mm and 100mm wafers – Chucks for small chips (min. 10x10mm2) – Manual dispense
– Programmable spin-sequence for polymers – 2 x high precision Präzitherm hotplates – Chucks for 100mm wafers and small chips (min. 10x10mm2) – Manual dispense
– Exposure with top-side or back-side alignment – Configurable illumination (i-line, broadband, DUV) – Multiple wafer/chip sizes up to 150mm wafer – Option for grayscale and talbot exposure
– Exposure with top-side alignment – i-line illumination (365nm) – Multiple wafer/chip sizes up to 100mm wafer – Holders for Cr masks and transparent foils – Dedicated chuck and objectives for chips
– Direct writing on Cr-blanks (4×4″ | 5×5″ | 6×6″ | 7×7″) or wafers (100mm | 150 mm). – Batch processing. Cassette to cassette. – UV-light source (i-line λ = 355nm) – Wizard for single or batch processing – Wizard for dose/focus calibrations – Advance mode for top side alignment overlay exposure – Compatible with .gds and .cif formats
– Direct writing on wafers and chips – Two laser sources (λ=405nm & λ=375nm) – Top- and backside alignment – Wizard for dose/focus calibrations – Compatible with .gds and .cif formats
– Direct writing on wafers and chips – Two laser sources (λ=405nm & λ=375nm) – Top- and backside alignment – Wizard for dose/focus calibrations – Compatible with .gds and .cif formats
– Thermal NIL up to 250°C – UV NIL @365nm or 405nm (with temperature up to 200°C) – Imprint in vacuum (~1mbar) – Uniform pressure (up to 6.5bar) applied trough a membrane – Replicable structures : ~40nm up to 100um
– Wet bench for solvent chemistry with beakers – Various beaker sizes and substrate holders – Solvents : acetone, IPA, PGMEA, TechniStrip Ni555 – DI H2O sinks with spray showers – 2x Bain-Marie with heating and ultrasonic options
– Wet bench for bases (developers) with beakers – Various beaker sizes and substrate holders – Bases: AZ 400K, AZ 351 B, AZ 726 MIF, AZ developer, TechniStrip P1316 – DI H2O sinks with spray showers – Centralized waste
– Oven dedicated to polyimide full curing – Maximum temperature: 300°C – Carriers for 100mm and 150mm wafers – Piece parts allowed – Nitrogen circulation
– Only for biocompatible devices – Maximum temperature: 350°C – Carriers for 100mm and 150mm wafers – Piece parts allowed – Nitrogen circulation – High efficiency particulate air filter – Possibility to monitor temperature
