Located halfway between development and production tool, this vacuum evaporator has been developed so as to offer multiple configurations.
– 8 metals available :
Au : 99.999%
Ni : 99.995 %
Pd : 99.95%
Pt : 99.99%
Cr : 99.994-99.998%
Al : 99.99%
Ti : 99.995%
Ag : 99.99%
– Deposition on several piece of wafer until max full 4” wafer (one)
– Working distance: 53cm between crucible and sample
– Sample rotation and cooled down
– Load lock
– Full automatic process
The thickness measurement is achieved using quartz crystal balance, remotely interfaced to the PLC sequences controller. This software allows to realize, in automatic mode, complex multilayers